TQPHT Overview
TriQuint’s 0.5 µm pHEMT process is based on our production released 0.25 µm gate process. TQPHT substitutes lower cost optical lithography in place of e-beam and adds TriQuint’s unique thick metal scheme. This process is targeted for high efficiency and linearity in power amplifiers, low noise amplifiers, and linear, low loss and high isolation RF switch applications.
TQPHT Key Features
- 4um Dielectric Metal 1
- Metal 1
- 2 Global
- 1 Local High-Q Passives Thin Film Resistors High Value Capacitors Backside Vias Optional Based on Production 0.25 µm pHE
