EQR1011-3030C-S Datasheet - NDL

EQR1011-3030C-S SiPMs

NDL EQR10 Series SiPMs For a conventional SiPM, the quenching resistors are usually fabricated on the surface, and used to connect all APD cells to trace metal lines. In contrast, NDL SiPM employs intrinsic epitaxial layer as the quenching resistors (EQR), and uses a continuous silicon cap layer as an anode to connect all the APD cells. As a result, the device has more compact structure and simpler fabrication technology, allows larger micro cell density (larger dynamic range) while retaining .

EQR1011-3030C-S Features

* Small Cell and Pitch

* High Cell Density and Fill Factor

* Large Dynamic Range and High PDE

* Fast Rise Time and Narrow Pulse Width

* Short Recovery Time and High Time Resolution

* Small Terminal Capacitance and Cost Effective Applications

* High Energy Physics

EQR1011-3030C-S Datasheet (1.00 MB)