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Digital FET, P-Channel
FDV304P, FDV304P-F169
General Description This P−Channel enhancement mode field effect transistors is
produced using onsemi’s proprietary, high cell density, DMOS technology. This very high density process is tailored to minimize on−state resistance at low gate drive conditions. This device is designed especially for application in battery power applications such as notebook computers and cellular phones. This device has excellent on−state resistance even at gate drive voltages as low as 2.5 V.
Features
• −25 V, −0.46 A Continuous, −1.5 A Peak
♦ RDS(on) = 1.1 W @ VGS = −4.5 V ♦ RDS(on) = 1.5 W @ VGS = −2.7 V
• Very Low Level Gate Drive Requirements Allowing Direct
Operation in 3 V Circuits. VGS(th) < 1.5 V
• Gate−Source Zener for ESD Ruggedness.