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XD1008-BD - Distributed Amplifier

Download the XD1008-BD datasheet PDF. This datasheet also covers the XD1008-BD-MA variant, as both devices belong to the same distributed amplifier family and are provided as variant models within a single manufacturer datasheet.

General Description

The XD1008-BD is a 30 kHz - 40 GHz GaAs MMIC distributed amplifier that has a gain of 15 dB with a 4.5 dB noise figure at 26 GHz.

This MMIC uses M/A-COM Technology Solutions’ GaAs pHEMT device model technology, and is based upon electron beam lithography to ensure high repeatability and uniformity.

Key Features

  • 15 dB Gain.
  • 22.5 dBm P1dB at 22 GHz.
  • 4.5 dB Noise Figure at 26 GHz.
  • Unconditional Stability over Temperature Range.
  • 100% On-Wafer RF, DC and Output Power Testing.
  • 100% Visual Inspection to MIL-STD-883 Method 2010.
  • RoHS.
  • Compliant and 260°C Reflow Compatible.

📥 Download Datasheet

Note: The manufacturer provides a single datasheet file (XD1008-BD-MA-COM.pdf) that lists specifications for multiple related part numbers.

📁 Similar Datasheet

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XD1004-BD GaAs MMIC Distributed Amplifier Mimix Broadband
XD1004-QT GaAs MMIC Distributed Amplifier Mimix Broadband

Other Datasheets by MACOM Technology Solutions

Part Number Description
XD1001-BD Distributed Amplifier

Full PDF Text Transcription (Reference)

The following content is an automatically extracted verbatim text from the original manufacturer datasheet and is provided for reference purposes only.

View original datasheet text
XD1008-BD Distributed Amplifier 30 kHz - 40 GHz Features  15 dB Gain  22.5 dBm P1dB at 22 GHz  4.5 dB Noise Figure at 26 GHz  Unconditional Stability over Temperature Range  100% On-Wafer RF, DC and Output Power Testing  100% Visual Inspection to MIL-STD-883 Method 2010  RoHS* Compliant and 260°C Reflow Compatible Description The XD1008-BD is a 30 kHz - 40 GHz GaAs MMIC distributed amplifier that has a gain of 15 dB with a 4.5 dB noise figure at 26 GHz. This MMIC uses M/A-COM Technology Solutions’ GaAs pHEMT device model technology, and is based upon electron beam lithography to ensure high repeatability and uniformity.