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DATA SHEET www.onsemi.com
Digital FET, N-Channel
FDV303N
General Description These N−Channel enhancement mode field effect transistors are
produced using onsemi’s proprietary, high cell density, DMOS technology. This very high density process is tailored to minimize on−state resistance at low gate drive conditions. This device is designed especially for application in battery circuits using either one lithium or three cadmium or NMH cells. It can be used as an inverter or for high−efficiency miniature discrete DC/DC conversion in compact portable electronic devices like cellular phones and pagers. This device has excellent on−state resistance even at gate drive voltages as low as 2.5 V.
Features
• 25 V, 0.68 A Continuous, 2 A Peak
♦ RDS(ON) = 0.45 Ω @ VGS = 4.5 V ♦ RDS(ON) = 0.